Flushing ring for mount assembly

A mount assembly, a rinse ring for a mount assembly, and a treatment method for increasing the residence time of an edge rinse gas in a heated mount assembly are described. The rinse ring has inner and outer diametric faces defining a thickness of the rinse ring, top and bottom surfaces defining a height of the rinse ring, and a thermal expansion feature. The rinse ring includes a plurality of apertures extending through the thickness and circumferentially aligned with a plurality of circumferentially spaced rinse outlets in the substrate support. 描述了支座组件、用于支座组件的冲洗环、及用于增加边缘冲洗气体在加热的支座组件中的停留时间的处理方法。冲洗环具有限定冲洗环的厚度的内直径面和外直径面、限定冲洗环的高度的顶部表面和底部表面、和热膨胀特征。冲洗环包括延伸穿过厚度并与基板支撑件中的多个在圆周上间隔的冲洗出口在圆周上对齐的多个孔隙。