Coating process method based on wide spectrum monitoring
The invention relates to a coating process method based on wide spectrum monitoring. The method comprises the steps that a workpiece to be coated and a monitoring piece are installed; initializing and loading a coating process; drawing a circumferential spectrum curve and positioning the angle posit...
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creator | PEI YUHUI QIN ZHENJIANG JI MING GUO YIMING ZHAO GANG YI HONGBO LIU WEIJI |
description | The invention relates to a coating process method based on wide spectrum monitoring. The method comprises the steps that a workpiece to be coated and a monitoring piece are installed; initializing and loading a coating process; drawing a circumferential spectrum curve and positioning the angle position of the monitoring sheet on the product turntable; automatically executing a coating process program; in the film coating process, spectral energy data of the monitoring piece are collected in real time, and the real thickness of the current film layer is obtained through fitting; calculating the layer change stop judgment time and triggering the layer change stop judgment logic; and after the layer is changed, coating the next film layer until all the film layers in the coating process are completed. According to the technical scheme, the layer changing position can be accurately positioned, the delay defect that layer changing is controlled through a conventional evaluation function method is overcome, the acc |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN117867461A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN117867461A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN117867461A3</originalsourceid><addsrcrecordid>eNrjZLBwzk8sycxLVygoyk9OLS5WyE0tychPUUhKLE5NUcjPUyjPTElVKC5ITS4pKs1VyM3PyyzJLwJq4GFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hobmFmbmJmaGjsbEqAEAHUoulA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Coating process method based on wide spectrum monitoring</title><source>esp@cenet</source><creator>PEI YUHUI ; QIN ZHENJIANG ; JI MING ; GUO YIMING ; ZHAO GANG ; YI HONGBO ; LIU WEIJI</creator><creatorcontrib>PEI YUHUI ; QIN ZHENJIANG ; JI MING ; GUO YIMING ; ZHAO GANG ; YI HONGBO ; LIU WEIJI</creatorcontrib><description>The invention relates to a coating process method based on wide spectrum monitoring. The method comprises the steps that a workpiece to be coated and a monitoring piece are installed; initializing and loading a coating process; drawing a circumferential spectrum curve and positioning the angle position of the monitoring sheet on the product turntable; automatically executing a coating process program; in the film coating process, spectral energy data of the monitoring piece are collected in real time, and the real thickness of the current film layer is obtained through fitting; calculating the layer change stop judgment time and triggering the layer change stop judgment logic; and after the layer is changed, coating the next film layer until all the film layers in the coating process are completed. According to the technical scheme, the layer changing position can be accurately positioned, the delay defect that layer changing is controlled through a conventional evaluation function method is overcome, the acc</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240412&DB=EPODOC&CC=CN&NR=117867461A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240412&DB=EPODOC&CC=CN&NR=117867461A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PEI YUHUI</creatorcontrib><creatorcontrib>QIN ZHENJIANG</creatorcontrib><creatorcontrib>JI MING</creatorcontrib><creatorcontrib>GUO YIMING</creatorcontrib><creatorcontrib>ZHAO GANG</creatorcontrib><creatorcontrib>YI HONGBO</creatorcontrib><creatorcontrib>LIU WEIJI</creatorcontrib><title>Coating process method based on wide spectrum monitoring</title><description>The invention relates to a coating process method based on wide spectrum monitoring. The method comprises the steps that a workpiece to be coated and a monitoring piece are installed; initializing and loading a coating process; drawing a circumferential spectrum curve and positioning the angle position of the monitoring sheet on the product turntable; automatically executing a coating process program; in the film coating process, spectral energy data of the monitoring piece are collected in real time, and the real thickness of the current film layer is obtained through fitting; calculating the layer change stop judgment time and triggering the layer change stop judgment logic; and after the layer is changed, coating the next film layer until all the film layers in the coating process are completed. According to the technical scheme, the layer changing position can be accurately positioned, the delay defect that layer changing is controlled through a conventional evaluation function method is overcome, the acc</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBwzk8sycxLVygoyk9OLS5WyE0tychPUUhKLE5NUcjPUyjPTElVKC5ITS4pKs1VyM3PyyzJLwJq4GFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hobmFmbmJmaGjsbEqAEAHUoulA</recordid><startdate>20240412</startdate><enddate>20240412</enddate><creator>PEI YUHUI</creator><creator>QIN ZHENJIANG</creator><creator>JI MING</creator><creator>GUO YIMING</creator><creator>ZHAO GANG</creator><creator>YI HONGBO</creator><creator>LIU WEIJI</creator><scope>EVB</scope></search><sort><creationdate>20240412</creationdate><title>Coating process method based on wide spectrum monitoring</title><author>PEI YUHUI ; QIN ZHENJIANG ; JI MING ; GUO YIMING ; ZHAO GANG ; YI HONGBO ; LIU WEIJI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117867461A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>PEI YUHUI</creatorcontrib><creatorcontrib>QIN ZHENJIANG</creatorcontrib><creatorcontrib>JI MING</creatorcontrib><creatorcontrib>GUO YIMING</creatorcontrib><creatorcontrib>ZHAO GANG</creatorcontrib><creatorcontrib>YI HONGBO</creatorcontrib><creatorcontrib>LIU WEIJI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PEI YUHUI</au><au>QIN ZHENJIANG</au><au>JI MING</au><au>GUO YIMING</au><au>ZHAO GANG</au><au>YI HONGBO</au><au>LIU WEIJI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Coating process method based on wide spectrum monitoring</title><date>2024-04-12</date><risdate>2024</risdate><abstract>The invention relates to a coating process method based on wide spectrum monitoring. The method comprises the steps that a workpiece to be coated and a monitoring piece are installed; initializing and loading a coating process; drawing a circumferential spectrum curve and positioning the angle position of the monitoring sheet on the product turntable; automatically executing a coating process program; in the film coating process, spectral energy data of the monitoring piece are collected in real time, and the real thickness of the current film layer is obtained through fitting; calculating the layer change stop judgment time and triggering the layer change stop judgment logic; and after the layer is changed, coating the next film layer until all the film layers in the coating process are completed. According to the technical scheme, the layer changing position can be accurately positioned, the delay defect that layer changing is controlled through a conventional evaluation function method is overcome, the acc</abstract><oa>free_for_read</oa></addata></record> |
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subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Coating process method based on wide spectrum monitoring |
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