Scanning electron microscope lamination sample preparation method

The invention relates to a scanning electron microscope lamination sample preparation method, which comprises the following steps: spraying a first metal on the surface of a scanning electron microscope sample to form a continuous conductive substrate layer; and second metal is sprayed on the substr...

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Bibliographische Detailangaben
Hauptverfasser: CHANG ZHENGKAI, ZHANG HAO, SI JUNLI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to a scanning electron microscope lamination sample preparation method, which comprises the following steps: spraying a first metal on the surface of a scanning electron microscope sample to form a continuous conductive substrate layer; and second metal is sprayed on the substrate layer to form a continuous conductive superposition layer, and the conductivity of the superposition layer is higher than that of the substrate layer. The problem of charge caused by poor conductivity of the single metal film layer is solved, so that the coverage distortion of the single metal film layer on the shape of the sample due to large particle aggregation is avoided, the method is superior to single target sputtering in the aspect of charge elimination, the contrast improvement of the shape of the scanning electron microscope sample is also gained, and the method is suitable for industrial production. A better imaging effect of samples with poor conductivity, especially powder, diaphragm and other poro