SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

The substrate processing apparatus according to the present invention comprises: a processing container including a processing chamber therein which can be decompressed to a pressure lower than atmospheric pressure; a holding part for holding the substrate in the processing chamber; and a nozzle tha...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KAWABUCHI YOSUKE, YASUTAKE TAKAHIRO, NAKASHIMA TSUNENAGA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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