Chamber assembly, air inlet device and substrate processing equipment

The invention provides a cavity assembly. The cavity assembly comprises an annular lining assembly and an air inlet inserting piece. The bushing assembly comprises an upper bushing and a lower bushing; a plurality of layers of first air inlet structures are arranged on one side of the lower bush, ea...

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Hauptverfasser: PANG YUNLING, LIU ZHUHAN, JIANG YONG
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Sprache:chi ; eng
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creator PANG YUNLING
LIU ZHUHAN
JIANG YONG
description The invention provides a cavity assembly. The cavity assembly comprises an annular lining assembly and an air inlet inserting piece. The bushing assembly comprises an upper bushing and a lower bushing; a plurality of layers of first air inlet structures are arranged on one side of the lower bush, each layer of first air inlet structure is divided into a plurality of first air inlet areas in the circumferential direction of the lower bush, and each first air inlet area comprises a plurality of first air inlet channels distributed in the circumferential direction of the lower bush; the air inlet plug-in is coupled to the lining assembly, multiple layers of second air inlet structures corresponding to the multiple layers of first air inlet structures are arranged in the air inlet plug-in, each layer of second air inlet structure is divided into multiple second air inlet areas in the horizontal direction, each second air inlet area comprises at least one second air inlet channel, and one second air inlet channel
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN117821934A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN117821934A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN117821934A3</originalsourceid><addsrcrecordid>eNqNyrEOwiAUBVAWB6P-w3PXAWuijobUODm5Nw96rSRAkUdN_HsXP8DpLGeuWvPkaFGIRRBt-GyIfSGfAir1eHsH4tSTTFZq4QrKZXQQ8WkgvCafI1JdqtmDg2D1c6HWl_ZurlvksYNkdkionblpfTju9KnZn5t_zhfxxzNf</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Chamber assembly, air inlet device and substrate processing equipment</title><source>esp@cenet</source><creator>PANG YUNLING ; LIU ZHUHAN ; JIANG YONG</creator><creatorcontrib>PANG YUNLING ; LIU ZHUHAN ; JIANG YONG</creatorcontrib><description>The invention provides a cavity assembly. The cavity assembly comprises an annular lining assembly and an air inlet inserting piece. The bushing assembly comprises an upper bushing and a lower bushing; a plurality of layers of first air inlet structures are arranged on one side of the lower bush, each layer of first air inlet structure is divided into a plurality of first air inlet areas in the circumferential direction of the lower bush, and each first air inlet area comprises a plurality of first air inlet channels distributed in the circumferential direction of the lower bush; the air inlet plug-in is coupled to the lining assembly, multiple layers of second air inlet structures corresponding to the multiple layers of first air inlet structures are arranged in the air inlet plug-in, each layer of second air inlet structure is divided into multiple second air inlet areas in the horizontal direction, each second air inlet area comprises at least one second air inlet channel, and one second air inlet channel</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240405&amp;DB=EPODOC&amp;CC=CN&amp;NR=117821934A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240405&amp;DB=EPODOC&amp;CC=CN&amp;NR=117821934A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PANG YUNLING</creatorcontrib><creatorcontrib>LIU ZHUHAN</creatorcontrib><creatorcontrib>JIANG YONG</creatorcontrib><title>Chamber assembly, air inlet device and substrate processing equipment</title><description>The invention provides a cavity assembly. The cavity assembly comprises an annular lining assembly and an air inlet inserting piece. The bushing assembly comprises an upper bushing and a lower bushing; a plurality of layers of first air inlet structures are arranged on one side of the lower bush, each layer of first air inlet structure is divided into a plurality of first air inlet areas in the circumferential direction of the lower bush, and each first air inlet area comprises a plurality of first air inlet channels distributed in the circumferential direction of the lower bush; the air inlet plug-in is coupled to the lining assembly, multiple layers of second air inlet structures corresponding to the multiple layers of first air inlet structures are arranged in the air inlet plug-in, each layer of second air inlet structure is divided into multiple second air inlet areas in the horizontal direction, each second air inlet area comprises at least one second air inlet channel, and one second air inlet channel</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEOwiAUBVAWB6P-w3PXAWuijobUODm5Nw96rSRAkUdN_HsXP8DpLGeuWvPkaFGIRRBt-GyIfSGfAir1eHsH4tSTTFZq4QrKZXQQ8WkgvCafI1JdqtmDg2D1c6HWl_ZurlvksYNkdkionblpfTju9KnZn5t_zhfxxzNf</recordid><startdate>20240405</startdate><enddate>20240405</enddate><creator>PANG YUNLING</creator><creator>LIU ZHUHAN</creator><creator>JIANG YONG</creator><scope>EVB</scope></search><sort><creationdate>20240405</creationdate><title>Chamber assembly, air inlet device and substrate processing equipment</title><author>PANG YUNLING ; LIU ZHUHAN ; JIANG YONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117821934A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>PANG YUNLING</creatorcontrib><creatorcontrib>LIU ZHUHAN</creatorcontrib><creatorcontrib>JIANG YONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PANG YUNLING</au><au>LIU ZHUHAN</au><au>JIANG YONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Chamber assembly, air inlet device and substrate processing equipment</title><date>2024-04-05</date><risdate>2024</risdate><abstract>The invention provides a cavity assembly. The cavity assembly comprises an annular lining assembly and an air inlet inserting piece. The bushing assembly comprises an upper bushing and a lower bushing; a plurality of layers of first air inlet structures are arranged on one side of the lower bush, each layer of first air inlet structure is divided into a plurality of first air inlet areas in the circumferential direction of the lower bush, and each first air inlet area comprises a plurality of first air inlet channels distributed in the circumferential direction of the lower bush; the air inlet plug-in is coupled to the lining assembly, multiple layers of second air inlet structures corresponding to the multiple layers of first air inlet structures are arranged in the air inlet plug-in, each layer of second air inlet structure is divided into multiple second air inlet areas in the horizontal direction, each second air inlet area comprises at least one second air inlet channel, and one second air inlet channel</abstract><oa>free_for_read</oa></addata></record>
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title Chamber assembly, air inlet device and substrate processing equipment
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