Method for manufacturing polarizing plate with anti-reflection layer

Method for manufacturing polarizing plate with anti-reflection layer

Provided is a method for manufacturing a polarizing plate with an anti-reflection layer, the method being capable of maintaining uniform characteristics of reflected light. The manufacturing method comprises a step Sa and a step Sb. In step Sa, an antireflection layer comprising two or more layers o...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: BEPPU HIROSHI, KUNIKATA SATORU, MATSUOKA HIDENOBU
Format: Patent
Sprache:chi ; eng
Schlagworte:
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator BEPPU HIROSHI
KUNIKATA SATORU
MATSUOKA HIDENOBU
description Provided is a method for manufacturing a polarizing plate with an anti-reflection layer, the method being capable of maintaining uniform characteristics of reflected light. The manufacturing method comprises a step Sa and a step Sb. In step Sa, an antireflection layer comprising two or more layers of thin films is formed on one main surface side of a thin film substrate (10). In step Sb, at least one layer constituting the anti-reflection layer is formed into a film, and then the film is irradiated with visible light and reflected light is detected. The film substrate (10) has a first protective film (11), a first adhesive layer (12), a polarizer (13), a second adhesive layer (14), and a second protective film (15) in this order. The distance (D1) between the first protective film (11) and the second protective film (15) in at least a portion of a portion (P) extending from both ends of the polarizer (13) in the width direction is narrower than the distance (D2) between the first protective film (11) and the
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN117741850A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN117741850A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN117741850A3</originalsourceid><addsrcrecordid>eNrjZHDxTS3JyE9RSMsvUshNzCtNS0wuKS3KzEtXKMjPSSzKrAIzcxJLUhXKM0syFBLzSjJ1i1LTclKTSzLz8xRyEitTi3gYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSbyzn6GhubmJoYWpgaMxMWoA9-UzXQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method for manufacturing polarizing plate with anti-reflection layer</title><source>esp@cenet</source><creator>BEPPU HIROSHI ; KUNIKATA SATORU ; MATSUOKA HIDENOBU</creator><creatorcontrib>BEPPU HIROSHI ; KUNIKATA SATORU ; MATSUOKA HIDENOBU</creatorcontrib><description>Provided is a method for manufacturing a polarizing plate with an anti-reflection layer, the method being capable of maintaining uniform characteristics of reflected light. The manufacturing method comprises a step Sa and a step Sb. In step Sa, an antireflection layer comprising two or more layers of thin films is formed on one main surface side of a thin film substrate (10). In step Sb, at least one layer constituting the anti-reflection layer is formed into a film, and then the film is irradiated with visible light and reflected light is detected. The film substrate (10) has a first protective film (11), a first adhesive layer (12), a polarizer (13), a second adhesive layer (14), and a second protective film (15) in this order. The distance (D1) between the first protective film (11) and the second protective film (15) in at least a portion of a portion (P) extending from both ends of the polarizer (13) in the width direction is narrower than the distance (D2) between the first protective film (11) and the</description><language>chi ; eng</language><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240322&amp;DB=EPODOC&amp;CC=CN&amp;NR=117741850A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240322&amp;DB=EPODOC&amp;CC=CN&amp;NR=117741850A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BEPPU HIROSHI</creatorcontrib><creatorcontrib>KUNIKATA SATORU</creatorcontrib><creatorcontrib>MATSUOKA HIDENOBU</creatorcontrib><title>Method for manufacturing polarizing plate with anti-reflection layer</title><description>Provided is a method for manufacturing a polarizing plate with an anti-reflection layer, the method being capable of maintaining uniform characteristics of reflected light. The manufacturing method comprises a step Sa and a step Sb. In step Sa, an antireflection layer comprising two or more layers of thin films is formed on one main surface side of a thin film substrate (10). In step Sb, at least one layer constituting the anti-reflection layer is formed into a film, and then the film is irradiated with visible light and reflected light is detected. The film substrate (10) has a first protective film (11), a first adhesive layer (12), a polarizer (13), a second adhesive layer (14), and a second protective film (15) in this order. The distance (D1) between the first protective film (11) and the second protective film (15) in at least a portion of a portion (P) extending from both ends of the polarizer (13) in the width direction is narrower than the distance (D2) between the first protective film (11) and the</description><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHDxTS3JyE9RSMsvUshNzCtNS0wuKS3KzEtXKMjPSSzKrAIzcxJLUhXKM0syFBLzSjJ1i1LTclKTSzLz8xRyEitTi3gYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSbyzn6GhubmJoYWpgaMxMWoA9-UzXQ</recordid><startdate>20240322</startdate><enddate>20240322</enddate><creator>BEPPU HIROSHI</creator><creator>KUNIKATA SATORU</creator><creator>MATSUOKA HIDENOBU</creator><scope>EVB</scope></search><sort><creationdate>20240322</creationdate><title>Method for manufacturing polarizing plate with anti-reflection layer</title><author>BEPPU HIROSHI ; KUNIKATA SATORU ; MATSUOKA HIDENOBU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117741850A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>BEPPU HIROSHI</creatorcontrib><creatorcontrib>KUNIKATA SATORU</creatorcontrib><creatorcontrib>MATSUOKA HIDENOBU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BEPPU HIROSHI</au><au>KUNIKATA SATORU</au><au>MATSUOKA HIDENOBU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method for manufacturing polarizing plate with anti-reflection layer</title><date>2024-03-22</date><risdate>2024</risdate><abstract>Provided is a method for manufacturing a polarizing plate with an anti-reflection layer, the method being capable of maintaining uniform characteristics of reflected light. The manufacturing method comprises a step Sa and a step Sb. In step Sa, an antireflection layer comprising two or more layers of thin films is formed on one main surface side of a thin film substrate (10). In step Sb, at least one layer constituting the anti-reflection layer is formed into a film, and then the film is irradiated with visible light and reflected light is detected. The film substrate (10) has a first protective film (11), a first adhesive layer (12), a polarizer (13), a second adhesive layer (14), and a second protective film (15) in this order. The distance (D1) between the first protective film (11) and the second protective film (15) in at least a portion of a portion (P) extending from both ends of the polarizer (13) in the width direction is narrower than the distance (D2) between the first protective film (11) and the</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN117741850A
source esp@cenet
subjects OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
title Method for manufacturing polarizing plate with anti-reflection layer
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T13%3A01%3A27IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=BEPPU%20HIROSHI&rft.date=2024-03-22&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN117741850A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true