SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

A substrate processing apparatus for processing a substrate by irradiating the substrate with a laser beam, the substrate processing apparatus comprising: a substrate holding unit for holding the substrate; a laser irradiation unit that irradiates the laser beam onto the substrate held by the substrate holding unit; and a dust collection unit that collects dust, in which the dust collection unit has: an upper dust collection unit that is disposed above the substrate holding unit; and a lower dust collection unit that moves relative to the upper dust collection unit below the upper dust collection unit. The substrate processing method includes: moving the substrate holding portion and the lower dust collecting portion to a position below the upper dust collecting portion; and irradiating the substrate with the laser beam from the laser irradiation unit, and collecting dust by using the upper dust collection unit to attract the atmosphere gas between the upper dust collection unit and the substrate and the lowe