Preparation method of high-performance multi-element doped zinc oxide transparent conductive film
The invention provides a preparation method of a high-performance multi-element doped zinc oxide transparent conductive film, which is characterized in that a Ga2O3 and MgF2 co-doped ZnO composite ceramic target material is used as a raw material, and a ZnO transparent conductive film with excellent...
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| creator | YE ZHIZHEN WANG FENGZHI XING LONGFEI PAN XINHUA |
| description | The invention provides a preparation method of a high-performance multi-element doped zinc oxide transparent conductive film, which is characterized in that a Ga2O3 and MgF2 co-doped ZnO composite ceramic target material is used as a raw material, and a ZnO transparent conductive film with excellent conductivity and high permeability in a visible light region is deposited on a substrate through a magnetron sputtering method. Compared with a traditional ZnO doping system, the method has the advantages that the requirement for the vacuum degree of the substrate is low (only 10 Pa), under the relatively low vacuum degree, the Ga/Mg/F ternary co-doped ZnO transparent conductive thin film can still play the synergistic effect of Ga/F elements and the function of expanding the forbidden band width of a material through Mg elements to keep good photoelectric performance, and the high-performance thin film is obtained. The method is low in requirement for the vacuum degree of the substrate, does not need anneal |
| format | Patent |
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Compared with a traditional ZnO doping system, the method has the advantages that the requirement for the vacuum degree of the substrate is low (only 10 <-3 > Pa), under the relatively low vacuum degree, the Ga/Mg/F ternary co-doped ZnO transparent conductive thin film can still play the synergistic effect of Ga/F elements and the function of expanding the forbidden band width of a material through Mg elements to keep good photoelectric performance, and the high-performance thin film is obtained. 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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Preparation method of high-performance multi-element doped zinc oxide transparent conductive film |
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