Integrated epitaxy and pre-cleaning system

The invention relates to an integrated epitaxy and pre-cleaning system. Embodiments of the present application generally relate to a transfer chamber coupled to at least one vapor phase epitaxy chamber and a plasma oxide removal chamber coupled to the transfer chamber, the plasma oxide removal chamber including a cap assembly having a mixing chamber and a gas distributor; a first gas inlet formed through a portion of the cap assembly and in fluid communication with the mixing chamber; a second gas inlet formed through a portion of the cap assembly and in fluid communication with the mixing chamber; a third gas inlet formed through a portion of the cap assembly and in fluid communication with the mixing chamber; and a substrate support having a substrate support surface; a lift member disposed in the recess of the substrate support surface and coupled to the lift actuator via the substrate support; and a load lock chamber coupled to the transfer chamber. 本发明涉及集成外延与预清洁系统。本申请案的实施方式大体上涉及耦接到至少一个气相外延腔室的转移腔室及耦接至转移腔室