Hafnium compound, hafnium precursor composition containing said hafnium compound, hafnium-containing thin film containing said hafnium compound or said hafnium precursor composition, and method for producing same

The present invention relates to a hafnium-containing precursor which can be used to form a variety of hafnium-containing thin films, which is liquid at room temperature and exhibits high volatility and high thermal stability, and thus can be used in a high-quality hafnium-containing thin film and a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LEE DOO-HUN, SHIN HYUNG-SOO, KIM HYUNANG, KWON CHEOL-HEE
Format: Patent
Sprache:chi ; eng
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