X-ray device based on two-stage electrostatic focusing structure
The invention provides an X-ray device based on a two-stage electrostatic focusing structure. The X-ray device comprises an electron gun, the two-stage electrostatic focusing structure, an anode target and an open type vacuum target chamber, the electron gun is used for generating electron beams, an...
Gespeichert in:
| Hauptverfasser: | , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | GUAN SHENGYUAN MA TAO LI HUADONG LIU YUNLONG LI XIANDONG YU LIANG NIE ZIXIN |
| description | The invention provides an X-ray device based on a two-stage electrostatic focusing structure. The X-ray device comprises an electron gun, the two-stage electrostatic focusing structure, an anode target and an open type vacuum target chamber, the electron gun is used for generating electron beams, and the electron beams are emitted to the target surface of the anode target; the two-stage electrostatic focusing structure is arranged between the electron beam output end of the electron gun and the anode target; the two-stage electrostatic focusing structure comprises a first-stage electrostatic focusing electrode and a second-stage electrostatic focusing electrode, the first-stage electrostatic focusing electrode is arranged at a cathode of the electron gun and used for carrying out beam restraining and focusing on electron beams, and the second-stage electrostatic focusing electrode is arranged at a cathode of the electron gun; the secondary electrostatic focusing electrode is used for performing secondary focu |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN117336933A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN117336933A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN117336933A3</originalsourceid><addsrcrecordid>eNrjZHCI0C1KrFRISS3LTE5VSEosTk1RyM9TKCnP1y0uSUxPVUjNSU0uKcoHckoykxXS8pNLizPz0hWKS4pKk0tKi1J5GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8s5-hobmxsZmlsbGjMTFqAMz_MYw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>X-ray device based on two-stage electrostatic focusing structure</title><source>esp@cenet</source><creator>GUAN SHENGYUAN ; MA TAO ; LI HUADONG ; LIU YUNLONG ; LI XIANDONG ; YU LIANG ; NIE ZIXIN</creator><creatorcontrib>GUAN SHENGYUAN ; MA TAO ; LI HUADONG ; LIU YUNLONG ; LI XIANDONG ; YU LIANG ; NIE ZIXIN</creatorcontrib><description>The invention provides an X-ray device based on a two-stage electrostatic focusing structure. The X-ray device comprises an electron gun, the two-stage electrostatic focusing structure, an anode target and an open type vacuum target chamber, the electron gun is used for generating electron beams, and the electron beams are emitted to the target surface of the anode target; the two-stage electrostatic focusing structure is arranged between the electron beam output end of the electron gun and the anode target; the two-stage electrostatic focusing structure comprises a first-stage electrostatic focusing electrode and a second-stage electrostatic focusing electrode, the first-stage electrostatic focusing electrode is arranged at a cathode of the electron gun and used for carrying out beam restraining and focusing on electron beams, and the second-stage electrostatic focusing electrode is arranged at a cathode of the electron gun; the secondary electrostatic focusing electrode is used for performing secondary focu</description><language>chi ; eng</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; X-RAY TECHNIQUE</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240102&DB=EPODOC&CC=CN&NR=117336933A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240102&DB=EPODOC&CC=CN&NR=117336933A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GUAN SHENGYUAN</creatorcontrib><creatorcontrib>MA TAO</creatorcontrib><creatorcontrib>LI HUADONG</creatorcontrib><creatorcontrib>LIU YUNLONG</creatorcontrib><creatorcontrib>LI XIANDONG</creatorcontrib><creatorcontrib>YU LIANG</creatorcontrib><creatorcontrib>NIE ZIXIN</creatorcontrib><title>X-ray device based on two-stage electrostatic focusing structure</title><description>The invention provides an X-ray device based on a two-stage electrostatic focusing structure. The X-ray device comprises an electron gun, the two-stage electrostatic focusing structure, an anode target and an open type vacuum target chamber, the electron gun is used for generating electron beams, and the electron beams are emitted to the target surface of the anode target; the two-stage electrostatic focusing structure is arranged between the electron beam output end of the electron gun and the anode target; the two-stage electrostatic focusing structure comprises a first-stage electrostatic focusing electrode and a second-stage electrostatic focusing electrode, the first-stage electrostatic focusing electrode is arranged at a cathode of the electron gun and used for carrying out beam restraining and focusing on electron beams, and the second-stage electrostatic focusing electrode is arranged at a cathode of the electron gun; the secondary electrostatic focusing electrode is used for performing secondary focu</description><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHCI0C1KrFRISS3LTE5VSEosTk1RyM9TKCnP1y0uSUxPVUjNSU0uKcoHckoykxXS8pNLizPz0hWKS4pKk0tKi1J5GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8s5-hobmxsZmlsbGjMTFqAMz_MYw</recordid><startdate>20240102</startdate><enddate>20240102</enddate><creator>GUAN SHENGYUAN</creator><creator>MA TAO</creator><creator>LI HUADONG</creator><creator>LIU YUNLONG</creator><creator>LI XIANDONG</creator><creator>YU LIANG</creator><creator>NIE ZIXIN</creator><scope>EVB</scope></search><sort><creationdate>20240102</creationdate><title>X-ray device based on two-stage electrostatic focusing structure</title><author>GUAN SHENGYUAN ; MA TAO ; LI HUADONG ; LIU YUNLONG ; LI XIANDONG ; YU LIANG ; NIE ZIXIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117336933A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>GUAN SHENGYUAN</creatorcontrib><creatorcontrib>MA TAO</creatorcontrib><creatorcontrib>LI HUADONG</creatorcontrib><creatorcontrib>LIU YUNLONG</creatorcontrib><creatorcontrib>LI XIANDONG</creatorcontrib><creatorcontrib>YU LIANG</creatorcontrib><creatorcontrib>NIE ZIXIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GUAN SHENGYUAN</au><au>MA TAO</au><au>LI HUADONG</au><au>LIU YUNLONG</au><au>LI XIANDONG</au><au>YU LIANG</au><au>NIE ZIXIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>X-ray device based on two-stage electrostatic focusing structure</title><date>2024-01-02</date><risdate>2024</risdate><abstract>The invention provides an X-ray device based on a two-stage electrostatic focusing structure. The X-ray device comprises an electron gun, the two-stage electrostatic focusing structure, an anode target and an open type vacuum target chamber, the electron gun is used for generating electron beams, and the electron beams are emitted to the target surface of the anode target; the two-stage electrostatic focusing structure is arranged between the electron beam output end of the electron gun and the anode target; the two-stage electrostatic focusing structure comprises a first-stage electrostatic focusing electrode and a second-stage electrostatic focusing electrode, the first-stage electrostatic focusing electrode is arranged at a cathode of the electron gun and used for carrying out beam restraining and focusing on electron beams, and the second-stage electrostatic focusing electrode is arranged at a cathode of the electron gun; the secondary electrostatic focusing electrode is used for performing secondary focu</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN117336933A |
| source | esp@cenet |
| subjects | ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY X-RAY TECHNIQUE |
| title | X-ray device based on two-stage electrostatic focusing structure |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T12%3A31%3A55IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=GUAN%20SHENGYUAN&rft.date=2024-01-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN117336933A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |