APPARATUS AND METHOD FOR DISPENSING THE GAS PHASE OF SOLID PRECURSOR

The invention relates to a device for dispensing a gas phase of at least one solid precursor, the apparatus comprises a vessel (1) intended to contain a solid phase (11) of said precursor, first heating means (10) configured to heat the vessel (1) and/or at least a portion of the solid phase (11) in...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TODOROVA VALENTINA, LAURENT, VINCENT, DULPHY HERVE, PLAZA SERGIO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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