Formation method of semiconductor structure

A forming method of a semiconductor structure comprises the steps that a substrate is provided, and the substrate comprises a device region and an isolation region which are arranged in the first direction; forming a gate structure extending along a second direction on the substrate, wherein the sec...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WANG HONGYAN, ZHANG YI, TANG HANJIE, KANG WENCE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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