Efficient plasma cleaning equipment capable of being used for multiple substrates

The invention discloses efficient plasma cleaning equipment capable of being used for multiple substrates. The efficient plasma cleaning equipment comprises a plasma reaction device, an air inlet device, an air exhaust device and a power supply device. The plasma reaction device comprises a cleaning cavity, an anode plate, a cathode plate, a substrate frame and a substrate; the gas inlet device comprises a gas inlet pipe, a gas mixing chamber, a heating cover, a thermometer, a gas cylinder, a mass flow meter, a vacuum gauge and a leakage valve; the exhaust device comprises a molecular pump, a mechanical pump, a vacuum gauge and a gate valve; the power supply device is a direct-current power supply. Micropores are distributed in a gas inlet pipe of the equipment, the pore diameter is gradually increased from a gas inlet end, and an anode plate and a cathode plate are porous plates with uniformly distributed micropores and play a role in uniformly guiding gas; a heating cover is arranged outside the gas mixing