Execution device and execution method of optical proximity correction
The invention discloses an execution device and an execution method for optical proximity correction. The optical proximity correction execution device comprises an analysis unit, a reverse pattern adding unit, a first optical proximity correction unit, a second optical proximity correction unit and...
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| creator | HUANG QIANTING QIU CHONGYI GUO HUIFANG LUO WEIQUAN LIU SHUYAN ZHENG YONGFENG |
| description | The invention discloses an execution device and an execution method for optical proximity correction. The optical proximity correction execution device comprises an analysis unit, a reverse pattern adding unit, a first optical proximity correction unit, a second optical proximity correction unit and an output unit. The analysis unit is used for analyzing a defect pattern on a photomask layout. The reverse pattern adding unit is used for arranging a reverse pattern in the defect pattern. The first optical proximity correction unit is used for executing a first optical proximity correction program on the whole of the photomask layout. The second optical proximity correction unit is used for executing a second optical proximity correction program aiming at the defect pattern of the photomask layout so as to improve the exposure tolerance window. The output unit is used for outputting the corrected photomask layout.
本发明公开一种光学邻近修正的执行装置与执行方法。光学邻近修正的执行装置包括一分析单元、一反向图案新增单元、一第一光学邻近修正单元、一第二光学邻近修正单元及一输出单元。分析单元用以于一光掩模布局图分 |
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本发明公开一种光学邻近修正的执行装置与执行方法。光学邻近修正的执行装置包括一分析单元、一反向图案新增单元、一第一光学邻近修正单元、一第二光学邻近修正单元及一输出单元。分析单元用以于一光掩模布局图分</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231208&DB=EPODOC&CC=CN&NR=117192887A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231208&DB=EPODOC&CC=CN&NR=117192887A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HUANG QIANTING</creatorcontrib><creatorcontrib>QIU CHONGYI</creatorcontrib><creatorcontrib>GUO HUIFANG</creatorcontrib><creatorcontrib>LUO WEIQUAN</creatorcontrib><creatorcontrib>LIU SHUYAN</creatorcontrib><creatorcontrib>ZHENG YONGFENG</creatorcontrib><title>Execution device and execution method of optical proximity correction</title><description>The invention discloses an execution device and an execution method for optical proximity correction. The optical proximity correction execution device comprises an analysis unit, a reverse pattern adding unit, a first optical proximity correction unit, a second optical proximity correction unit and an output unit. The analysis unit is used for analyzing a defect pattern on a photomask layout. The reverse pattern adding unit is used for arranging a reverse pattern in the defect pattern. The first optical proximity correction unit is used for executing a first optical proximity correction program on the whole of the photomask layout. The second optical proximity correction unit is used for executing a second optical proximity correction program aiming at the defect pattern of the photomask layout so as to improve the exposure tolerance window. The output unit is used for outputting the corrected photomask layout.
本发明公开一种光学邻近修正的执行装置与执行方法。光学邻近修正的执行装置包括一分析单元、一反向图案新增单元、一第一光学邻近修正单元、一第二光学邻近修正单元及一输出单元。分析单元用以于一光掩模布局图分</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHB1rUhNLi3JzM9TSEkty0xOVUjMS1FIhQvmppZk5Kco5Kcp5BeUZCYn5igUFOVXZOZmllQqJOcXFaUmg5TxMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JJ4Zz9DQ3NDSyMLC3NHY2LUAAAxpjPe</recordid><startdate>20231208</startdate><enddate>20231208</enddate><creator>HUANG QIANTING</creator><creator>QIU CHONGYI</creator><creator>GUO HUIFANG</creator><creator>LUO WEIQUAN</creator><creator>LIU SHUYAN</creator><creator>ZHENG YONGFENG</creator><scope>EVB</scope></search><sort><creationdate>20231208</creationdate><title>Execution device and execution method of optical proximity correction</title><author>HUANG QIANTING ; QIU CHONGYI ; GUO HUIFANG ; LUO WEIQUAN ; LIU SHUYAN ; ZHENG YONGFENG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117192887A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>HUANG QIANTING</creatorcontrib><creatorcontrib>QIU CHONGYI</creatorcontrib><creatorcontrib>GUO HUIFANG</creatorcontrib><creatorcontrib>LUO WEIQUAN</creatorcontrib><creatorcontrib>LIU SHUYAN</creatorcontrib><creatorcontrib>ZHENG YONGFENG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HUANG QIANTING</au><au>QIU CHONGYI</au><au>GUO HUIFANG</au><au>LUO WEIQUAN</au><au>LIU SHUYAN</au><au>ZHENG YONGFENG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Execution device and execution method of optical proximity correction</title><date>2023-12-08</date><risdate>2023</risdate><abstract>The invention discloses an execution device and an execution method for optical proximity correction. The optical proximity correction execution device comprises an analysis unit, a reverse pattern adding unit, a first optical proximity correction unit, a second optical proximity correction unit and an output unit. The analysis unit is used for analyzing a defect pattern on a photomask layout. The reverse pattern adding unit is used for arranging a reverse pattern in the defect pattern. The first optical proximity correction unit is used for executing a first optical proximity correction program on the whole of the photomask layout. The second optical proximity correction unit is used for executing a second optical proximity correction program aiming at the defect pattern of the photomask layout so as to improve the exposure tolerance window. The output unit is used for outputting the corrected photomask layout.
本发明公开一种光学邻近修正的执行装置与执行方法。光学邻近修正的执行装置包括一分析单元、一反向图案新增单元、一第一光学邻近修正单元、一第二光学邻近修正单元及一输出单元。分析单元用以于一光掩模布局图分</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Execution device and execution method of optical proximity correction |
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