Near-mid infrared and 1.06 and 1.54 micron laser compatible stealth film
The invention relates to a preparation technology of an optical stealth material, in particular to a stealth film compatible with 1.06-micron and 1.54-micron laser in near-infrared and mid-infrared. The structure is SUB (AB1AB) NcAIR, SUB is a substrate, AIR is air, A is a high-refractive-index mate...
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| creator | ZHAO YALI CHANG WEIXIA MA TENG LI YONG GAO JIAQI |
| description | The invention relates to a preparation technology of an optical stealth material, in particular to a stealth film compatible with 1.06-micron and 1.54-micron laser in near-infrared and mid-infrared. The structure is SUB (AB1AB) NcAIR, SUB is a substrate, AIR is air, A is a high-refractive-index material layer, B and B1 are low-refractive-index material layers with different thicknesses, and Nc represents the number of cycles. According to the invention, high reflectivity can be presented on the whole in near and middle infrared bands, and the reflectivity is more than 99%. Low reflectivity is shown at the wavelength of 1060 nm and 1540 nm of laser, and the reflectivity is 3% and 9% respectively. Compatible stealth under near-infrared, mid-infrared and laser conditions can be realized.
本发明涉及光学隐身材料制备技术，具体为一种近中红外与1.06和1.54微米激光兼容隐身膜。其结构为SUB|(AB1AB)Nc|AIR，其中SUB是基底，AIR是空气，A为高折射率材料层，B和B1为厚度不同的低折射率材料层，Nc表示周期数。本发明可以实现在近中红外波段，整体呈现为高反射率，反射率为99％以上。在激光1060nm和1540nm波长处呈现低反射率，反射率分别为3％、9％。其可以实现近中红外与激光条件下的兼容隐身。 |
| format | Patent |
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本发明涉及光学隐身材料制备技术，具体为一种近中红外与1.06和1.54微米激光兼容隐身膜。其结构为SUB|(AB1AB)Nc|AIR，其中SUB是基底，AIR是空气，A为高折射率材料层，B和B1为厚度不同的低折射率材料层，Nc表示周期数。本发明可以实现在近中红外波段，整体呈现为高反射率，反射率为99％以上。在激光1060nm和1540nm波长处呈现低反射率，反射率分别为3％、9％。其可以实现近中红外与激光条件下的兼容隐身。</description><language>chi ; eng</language><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231201&DB=EPODOC&CC=CN&NR=117148480A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231201&DB=EPODOC&CC=CN&NR=117148480A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZHAO YALI</creatorcontrib><creatorcontrib>CHANG WEIXIA</creatorcontrib><creatorcontrib>MA TENG</creatorcontrib><creatorcontrib>LI YONG</creatorcontrib><creatorcontrib>GAO JIAQI</creatorcontrib><title>Near-mid infrared and 1.06 and 1.54 micron laser compatible stealth film</title><description>The invention relates to a preparation technology of an optical stealth material, in particular to a stealth film compatible with 1.06-micron and 1.54-micron laser in near-infrared and mid-infrared. The structure is SUB (AB1AB) NcAIR, SUB is a substrate, AIR is air, A is a high-refractive-index material layer, B and B1 are low-refractive-index material layers with different thicknesses, and Nc represents the number of cycles. According to the invention, high reflectivity can be presented on the whole in near and middle infrared bands, and the reflectivity is more than 99%. Low reflectivity is shown at the wavelength of 1060 nm and 1540 nm of laser, and the reflectivity is 3% and 9% respectively. Compatible stealth under near-infrared, mid-infrared and laser conditions can be realized.
本发明涉及光学隐身材料制备技术，具体为一种近中红外与1.06和1.54微米激光兼容隐身膜。其结构为SUB|(AB1AB)Nc|AIR，其中SUB是基底，AIR是空气，A为高折射率材料层，B和B1为厚度不同的低折射率材料层，Nc表示周期数。本发明可以实现在近中红外波段，整体呈现为高反射率，反射率为99％以上。在激光1060nm和1540nm波长处呈现低反射率，反射率分别为3％、9％。其可以实现近中红外与激光条件下的兼容隐身。</description><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyj0OwjAMQOEsDAi4gzlAUSMCdEUVqFMn9sokjmopf3Jyf7H0AEzvG95eTTOhdJEdcPKCQg4wOdCX_r7hZiCylZwgYCUBm2PBxt9AUBthaCt4DvGodh5DpdPWgzq_X59x6qjkhWpBS4naMs5aP7QZzNA_r_88P2cDMfo</recordid><startdate>20231201</startdate><enddate>20231201</enddate><creator>ZHAO YALI</creator><creator>CHANG WEIXIA</creator><creator>MA TENG</creator><creator>LI YONG</creator><creator>GAO JIAQI</creator><scope>EVB</scope></search><sort><creationdate>20231201</creationdate><title>Near-mid infrared and 1.06 and 1.54 micron laser compatible stealth film</title><author>ZHAO YALI ; CHANG WEIXIA ; MA TENG ; LI YONG ; GAO JIAQI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117148480A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>ZHAO YALI</creatorcontrib><creatorcontrib>CHANG WEIXIA</creatorcontrib><creatorcontrib>MA TENG</creatorcontrib><creatorcontrib>LI YONG</creatorcontrib><creatorcontrib>GAO JIAQI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ZHAO YALI</au><au>CHANG WEIXIA</au><au>MA TENG</au><au>LI YONG</au><au>GAO JIAQI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Near-mid infrared and 1.06 and 1.54 micron laser compatible stealth film</title><date>2023-12-01</date><risdate>2023</risdate><abstract>The invention relates to a preparation technology of an optical stealth material, in particular to a stealth film compatible with 1.06-micron and 1.54-micron laser in near-infrared and mid-infrared. The structure is SUB (AB1AB) NcAIR, SUB is a substrate, AIR is air, A is a high-refractive-index material layer, B and B1 are low-refractive-index material layers with different thicknesses, and Nc represents the number of cycles. According to the invention, high reflectivity can be presented on the whole in near and middle infrared bands, and the reflectivity is more than 99%. Low reflectivity is shown at the wavelength of 1060 nm and 1540 nm of laser, and the reflectivity is 3% and 9% respectively. Compatible stealth under near-infrared, mid-infrared and laser conditions can be realized.
本发明涉及光学隐身材料制备技术，具体为一种近中红外与1.06和1.54微米激光兼容隐身膜。其结构为SUB|(AB1AB)Nc|AIR，其中SUB是基底，AIR是空气，A为高折射率材料层，B和B1为厚度不同的低折射率材料层，Nc表示周期数。本发明可以实现在近中红外波段，整体呈现为高反射率，反射率为99％以上。在激光1060nm和1540nm波长处呈现低反射率，反射率分别为3％、9％。其可以实现近中红外与激光条件下的兼容隐身。</abstract><oa>free_for_read</oa></addata></record> |
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| title | Near-mid infrared and 1.06 and 1.54 micron laser compatible stealth film |
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