Method for manufacturing nozzle plate, nozzle plate, and fluid head

A nozzle plate having at least a nozzle tapered portion (12) and a linear communication path (13) in a nozzle hole is manufactured through the following steps (1) to (5). Step 1 (S-1) is a step for preparing a single crystal silicon substrate (1) having a (100)-plane crystal orientation on the surface, Step 2 (S-2) is a step for similarly forming a mask layer (2) on the surface of the single crystal silicon substrate, Step 3 (S-3) is a step for forming an opening pattern (3) on the mask layer, and Step 4 (S-5) is a step for forming an opening pattern (3) on the surface of the single crystal silicon substrate. Step 4 (S-4): a step for forming a through-hole (4) by performing through-processing from the surface of the single crystal silicon substrate positioned under the opening pattern by dry etching, and Step 5 (S-5): enlarging the through-hole by anisotropic wet etching of the single crystal silicon substrate. And a step for forming a nozzle tapered section and a linear communication path continuous with the