Semiconductor structure and forming method thereof

A method of forming a semiconductor structure includes providing a semiconductor substrate having a source/drain feature and a gate structure formed thereon; forming an interlayer dielectric layer on the semiconductor substrate; patterning the interlayer dielectric layer to form a trench to expose t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WANG CHAOXUN, YAO JIAXIAN, CAI ZHONGHAO, YANG FUKAI, XUE WANRONG, WANG MEIYUN, HUANG YANJUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!