SUBSTRATE SUPPORT DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

The substrate supporting apparatus according to one aspect of the present invention comprises: a seat plate member on which a substrate is placed; a shaft member coupled to a lower portion of the seat plate member to support the seat plate member; and a gap flange member coupled to the shaft member or the seat plate member to define an insulating gap between the shaft member and the gap flange member and between the seat plate member and the gap flange member, the gap flange member including an air inlet port and an air outlet port, and the cooling gas is circulated in the heat insulation gap. 根据本发明的一个方面的衬底支撑装置包括：座板部件，衬底放置在所述座板部件上；轴部件，所述轴部件联接到所述座板部件的下部以支撑所述座板部件；和间隙凸缘部件，所述间隙凸缘部件联接到所述轴部件或所述座板部件，以限定所述轴部件与所述间隙凸缘部件之间以及所述座板部件与所述间隙凸缘部件之间的隔热间隙，所述间隙凸缘部件包括进气端口和出气端口，使得冷却气体在所述隔热间隙中循环。