Low-absorbance photosensitizer and application thereof in photoresist composition

The invention relates to the technical field of high-molecular polymers, in particular to the field of IPC C07C229, and more particularly relates to a low-absorbance photosensitizer and application of the low-absorbance photosensitizer in a photoresist composition. The general formula of the structure of the low-absorbance photosensitizer is I or II, each structure comprises a cation part and an anion part: # imgabs0 #, substituent groups of R1, R2 and R3 comprise aromatic groups or alkyl groups, Rx comprises one of alkyl substituent groups of a monocyclic, polycyclic or three-dimensional cage-shaped structure with the carbon atom number of 5-20, and Ry is one of alkyl substituent groups of a monocyclic, polycyclic or three-dimensional cage-shaped structure with the carbon atom number of 5-20. And Rf comprises one of a trifluoromethyl group, a perfluorobutyl group, a perfluoroethyl group and a perfluoropropyl group. The specific photosensitizer is used, so that the absorbance of the photoresist formula is red