Positive photosensitive resin composition, insulating film, and display device including same

The present invention relates to a positive photosensitive resin composition, an insulating film, and a display device comprising the same. The present invention relates to a positive photosensitive resin composition, an insulating film, and a display device including the same, and more particularly...

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Bibliographische Detailangaben
Hauptverfasser:	SONG IN-HO, YOUN HYOC-MIN, LYU TAIXUN, KIM DONG-MYUNG, ZHANG GENSHI, LEE SUK-HYUN, WU LULI, LEE SUN HEE, PARK AHREUM
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to a positive photosensitive resin composition, an insulating film, and a display device comprising the same. The present invention relates to a positive photosensitive resin composition, an insulating film, and a display device including the same, and more particularly, to a positive photosensitive resin composition, an insulating film, and a display device including the same, which can ensure excellent sensitivity and excellent chemical resistance, heat resistance, and hygroscopicity by including a hydroxyl group-containing polymer. 本发明涉及一种正型感光性树脂组合物、绝缘膜以及包含所述绝缘膜的显示装置，尤其涉及一种可以通过包含含有羟基的聚合物而确保优秀的灵敏度并确保优秀的耐化学性、耐热性以及吸湿性的正型感光性树脂组合物、绝缘膜以及包含所述绝缘膜的显示装置。