Enhancing performance of overlay metrology

A method for metrology includes directing at least one illumination beam to illuminate a semiconductor wafer on which at least a first patterned layer and a second patterned layer have been successively deposited, a first target feature in the first patterned layer and a second target feature in the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PASKOVER YURI, MANASSEN AMNON, LEVINSKI VLADIMIR, VAKNIN YUVAL, BEN-DAVID NIR, UZIEL YOHAN, GUTMAN NADAV, SIMON YVON, ROTHMAN NIR, HILL ANDREW V, NEGRI DARIA, REDDY, NIRANJAN, K, GOLOTASIVAN ANDREI, ABRAMOV AVI, YAKOV DMITRY
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!