MEMS element, optical scanning device, distance measuring device, and method for manufacturing MEMS element

An optical scanning device (1), which is a MEMS element, is provided with: a first insulating layer (34), a first semiconductor layer (31), a second insulating layer (32), and a second semiconductor layer (33), which are laminated in this order; a first impurity region (16) formed at the interface b...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: SHIRAYANAGI YUSUKE
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:An optical scanning device (1), which is a MEMS element, is provided with: a first insulating layer (34), a first semiconductor layer (31), a second insulating layer (32), and a second semiconductor layer (33), which are laminated in this order; a first impurity region (16) formed at the interface between the first insulating layer (34) and the first semiconductor layer (31); a second impurity region (17) formed at the interface between the first semiconductor layer (31) and the second insulating layer (32); and a first wiring portion (39A) and a second wiring portion (39B) disposed on the first insulating layer (34) at a distance from each other. The first impurity region (16) and the second impurity region (17) are electrically connected in parallel between the first wiring portion (39A) and the second wiring portion (39B). 作为MEMS元件的光扫描装置(1)具备:依次层叠的第一绝缘层(34)、第一半导体层(31)、第二绝缘层(32)以及第二半导体层(33);第一杂质区域(16),形成于第一绝缘层(34)与第一半导体层(31)的界面;第二杂质区域(17),形成于第一半导体层(31)与第二绝缘层(32)的界面;以及第一布线部分(39A)及第二布线部分(39B),在第一绝缘层(34)上隔开距离地