METHOD AND DEVICE FOR DETERMINING A HEATING STATE OF AN OPTICAL ELEMENT IN AN OPTICAL SYSTEM

The invention relates to a method and an apparatus for determining the heating state of an optical element in an optical system, more particularly in a microlithographic projection exposure system, in which during operation of the optical system electromagnetic radiation impinges on an incident surf...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LORENZ MICHAEL, MITEV, VIATCHESLAV, MARK, ROBERT, SCHULER JOACHIM, SCHNEIDER, ECKHARD
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!