Method for manufacturing component and plasma processing apparatus

The embodiment of the invention provides a preparation method of a part and a plasma processing device, relates to the technical field of plasma processing, and is used for solving the problem of how to improve the durability of the part in the plasma processing device. A plasma processing apparatus includes a chamber for performing plasma processing, and a component in which at least a portion of a structure is exposed in the chamber. The component comprises a base body, a first connecting layer covering the outer surface of the base body and a first protective layer covering the outer surface of the first connecting layer. The material of the matrix comprises first metal ions; the material of the first connecting layer comprises a first functional group, and the first functional group has a function of bonding with metal ions; the material of the first protective layer comprises a first metal oxide, the first metal oxide comprises second metal ions, and the first metal oxide comprises second metal ions; whe