Semiconductor leveling and focusing workbench

The invention provides a semiconductor leveling and focusing workbench which comprises a working platform used for containing wafers, a plurality of sets of adjusting devices are evenly installed on the working platform, and the wafers contained on the working platform are synchronously leveled and focused through the adjusting devices. A mounting plate is arranged on the side, away from the wafer, of the working platform, the fixed end of the adjusting device is connected to the upper surface of the mounting plate, the driving end of the adjusting device is connected with the working platform, and the fixed end of the adjusting device drives the driving end to drive the joint with the working platform to move in the direction perpendicular to the horizontal plane in the non-contact state with the driving end. The invention is used for solving the problem in the prior art that the preparation time before exposure is too long and the productivity is influenced because the wafer needs to be leveled and focused