Method for exposing relief precursors in multiple distributions
A method, control device and exposure device for exposing a relief precursor (P) with a light source (2), the irradiation area of which covers a part of the area of the precursor, in which exposure of the entire area of the precursor is performed by moving the light source and the precursor relative...
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| creator | THATER MICHAEL BEIER MARCO |
| description | A method, control device and exposure device for exposing a relief precursor (P) with a light source (2), the irradiation area of which covers a part of the area of the precursor, in which exposure of the entire area of the precursor is performed by moving the light source and the precursor relative to each other during an exposure pass, the method comprising: a step (20) of providing a mask (4) on a photosensitive layer; a first exposure step (ES1) comprising exposing the precursor during one or more exposure passes according to a first intensity profile (IP1) and a first speed profile (SP1); a second exposure step (ES2) comprising exposing the precursor during one or more exposure passes according to a second intensity profile (IP2) different from the first intensity profile (IP1) and a second velocity profile (SP2) different from the first velocity profile (SP1).
一种利用光源(2)曝光浮雕前体(P)的方法、控制装置和曝光装置，光源(2)的照射区域覆盖前体的区域的一部分，其中在曝光通程期间通过相对于彼此移动光源和前体来执行对前体的整个区域的曝光，该方法包括：在光敏层上设置掩模(4)的步骤(20)；第一曝光步骤(ES1)，该第一曝光步骤包括在一个或更多 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN116569110A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN116569110A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN116569110A3</originalsourceid><addsrcrecordid>eNrjZLD3TS3JyE9RSMsvUkitKMgvzsxLVyhKzclMTVMoKEpNLi0qzi8qVsjMU8gtzSnJLMhJVUjJLC4pykwqLcnMzyvmYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GhmamZpaGhgaOxsSoAQDnETG8</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method for exposing relief precursors in multiple distributions</title><source>esp@cenet</source><creator>THATER MICHAEL ; BEIER MARCO</creator><creatorcontrib>THATER MICHAEL ; BEIER MARCO</creatorcontrib><description>A method, control device and exposure device for exposing a relief precursor (P) with a light source (2), the irradiation area of which covers a part of the area of the precursor, in which exposure of the entire area of the precursor is performed by moving the light source and the precursor relative to each other during an exposure pass, the method comprising: a step (20) of providing a mask (4) on a photosensitive layer; a first exposure step (ES1) comprising exposing the precursor during one or more exposure passes according to a first intensity profile (IP1) and a first speed profile (SP1); a second exposure step (ES2) comprising exposing the precursor during one or more exposure passes according to a second intensity profile (IP2) different from the first intensity profile (IP1) and a second velocity profile (SP2) different from the first velocity profile (SP1).
一种利用光源(2)曝光浮雕前体(P)的方法、控制装置和曝光装置，光源(2)的照射区域覆盖前体的区域的一部分，其中在曝光通程期间通过相对于彼此移动光源和前体来执行对前体的整个区域的曝光，该方法包括：在光敏层上设置掩模(4)的步骤(20)；第一曝光步骤(ES1)，该第一曝光步骤包括在一个或更多</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230808&DB=EPODOC&CC=CN&NR=116569110A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230808&DB=EPODOC&CC=CN&NR=116569110A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>THATER MICHAEL</creatorcontrib><creatorcontrib>BEIER MARCO</creatorcontrib><title>Method for exposing relief precursors in multiple distributions</title><description>A method, control device and exposure device for exposing a relief precursor (P) with a light source (2), the irradiation area of which covers a part of the area of the precursor, in which exposure of the entire area of the precursor is performed by moving the light source and the precursor relative to each other during an exposure pass, the method comprising: a step (20) of providing a mask (4) on a photosensitive layer; a first exposure step (ES1) comprising exposing the precursor during one or more exposure passes according to a first intensity profile (IP1) and a first speed profile (SP1); a second exposure step (ES2) comprising exposing the precursor during one or more exposure passes according to a second intensity profile (IP2) different from the first intensity profile (IP1) and a second velocity profile (SP2) different from the first velocity profile (SP1).
一种利用光源(2)曝光浮雕前体(P)的方法、控制装置和曝光装置，光源(2)的照射区域覆盖前体的区域的一部分，其中在曝光通程期间通过相对于彼此移动光源和前体来执行对前体的整个区域的曝光，该方法包括：在光敏层上设置掩模(4)的步骤(20)；第一曝光步骤(ES1)，该第一曝光步骤包括在一个或更多</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD3TS3JyE9RSMsvUkitKMgvzsxLVyhKzclMTVMoKEpNLi0qzi8qVsjMU8gtzSnJLMhJVUjJLC4pykwqLcnMzyvmYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GhmamZpaGhgaOxsSoAQDnETG8</recordid><startdate>20230808</startdate><enddate>20230808</enddate><creator>THATER MICHAEL</creator><creator>BEIER MARCO</creator><scope>EVB</scope></search><sort><creationdate>20230808</creationdate><title>Method for exposing relief precursors in multiple distributions</title><author>THATER MICHAEL ; BEIER MARCO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN116569110A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>THATER MICHAEL</creatorcontrib><creatorcontrib>BEIER MARCO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>THATER MICHAEL</au><au>BEIER MARCO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method for exposing relief precursors in multiple distributions</title><date>2023-08-08</date><risdate>2023</risdate><abstract>A method, control device and exposure device for exposing a relief precursor (P) with a light source (2), the irradiation area of which covers a part of the area of the precursor, in which exposure of the entire area of the precursor is performed by moving the light source and the precursor relative to each other during an exposure pass, the method comprising: a step (20) of providing a mask (4) on a photosensitive layer; a first exposure step (ES1) comprising exposing the precursor during one or more exposure passes according to a first intensity profile (IP1) and a first speed profile (SP1); a second exposure step (ES2) comprising exposing the precursor during one or more exposure passes according to a second intensity profile (IP2) different from the first intensity profile (IP1) and a second velocity profile (SP2) different from the first velocity profile (SP1).
一种利用光源(2)曝光浮雕前体(P)的方法、控制装置和曝光装置，光源(2)的照射区域覆盖前体的区域的一部分，其中在曝光通程期间通过相对于彼此移动光源和前体来执行对前体的整个区域的曝光，该方法包括：在光敏层上设置掩模(4)的步骤(20)；第一曝光步骤(ES1)，该第一曝光步骤包括在一个或更多</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Method for exposing relief precursors in multiple distributions |
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