Chemical filament residual agent cleaning device
The invention provides a chemical filament residual agent cleaning device, and relates to the technical field of textile processing, the chemical filament residual agent cleaning device comprises a workbench, side sliding rails are fixedly mounted on the two sides of the upper surface of the workben...
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| creator | GU XIAOJIAN GONG ZHENJIE YU ZIHAO ZHANG WEI ZHANG ZHENKAI LU KAILING YU XINGMEI |
| description | The invention provides a chemical filament residual agent cleaning device, and relates to the technical field of textile processing, the chemical filament residual agent cleaning device comprises a workbench, side sliding rails are fixedly mounted on the two sides of the upper surface of the workbench respectively, limiting supports are arranged on the two sides of each side sliding rail, and supporting columns are mounted on the outer sides of the two side sliding rails through matched sliding blocks; an upper connecting plate is fixedly mounted at the upper ends of the two supporting columns jointly, the ends of a plurality of filaments can be uniformly clamped through the collecting assembly, then the filaments are automatically drawn out through a first motor, and therefore people do not need to throw and adjust the filaments; the problems that a plurality of filament materials are inconvenient to collect during cleaning, so that the filament materials need to be manually treated by personnel, the contact |
| format | Patent |
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an upper connecting plate is fixedly mounted at the upper ends of the two supporting columns jointly, the ends of a plurality of filaments can be uniformly clamped through the collecting assembly, then the filaments are automatically drawn out through a first motor, and therefore people do not need to throw and adjust the filaments; the problems that a plurality of filament materials are inconvenient to collect during cleaning, so that the filament materials need to be manually treated by personnel, the contact</description><language>chi ; eng</language><subject>FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR ; LAUNDERING ; TEXTILES ; TREATING TEXTILE MATERIALS BY LIQUIDS, GASES OR VAPOURS ; TREATMENT OF TEXTILES OR THE LIKE</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230808&DB=EPODOC&CC=CN&NR=116555994A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230808&DB=EPODOC&CC=CN&NR=116555994A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GU XIAOJIAN</creatorcontrib><creatorcontrib>GONG ZHENJIE</creatorcontrib><creatorcontrib>YU ZIHAO</creatorcontrib><creatorcontrib>ZHANG WEI</creatorcontrib><creatorcontrib>ZHANG ZHENKAI</creatorcontrib><creatorcontrib>LU KAILING</creatorcontrib><creatorcontrib>YU XINGMEI</creatorcontrib><title>Chemical filament residual agent cleaning device</title><description>The invention provides a chemical filament residual agent cleaning device, and relates to the technical field of textile processing, the chemical filament residual agent cleaning device comprises a workbench, side sliding rails are fixedly mounted on the two sides of the upper surface of the workbench respectively, limiting supports are arranged on the two sides of each side sliding rail, and supporting columns are mounted on the outer sides of the two side sliding rails through matched sliding blocks; an upper connecting plate is fixedly mounted at the upper ends of the two supporting columns jointly, the ends of a plurality of filaments can be uniformly clamped through the collecting assembly, then the filaments are automatically drawn out through a first motor, and therefore people do not need to throw and adjust the filaments; the problems that a plurality of filament materials are inconvenient to collect during cleaning, so that the filament materials need to be manually treated by personnel, the contact</description><subject>FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR</subject><subject>LAUNDERING</subject><subject>TEXTILES</subject><subject>TREATING TEXTILE MATERIALS BY LIQUIDS, GASES OR VAPOURS</subject><subject>TREATMENT OF TEXTILES OR THE LIKE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDBwzkjNzUxOzFFIy8xJzE3NK1EoSi3OTCkFiiSmg7jJOamJeZl56QopqWWZyak8DKxpiTnFqbxQmptB0c01xNlDN7UgPz61uCAxOTUvtSTe2c_Q0MzU1NTS0sTRmBg1AFn_K1A</recordid><startdate>20230808</startdate><enddate>20230808</enddate><creator>GU XIAOJIAN</creator><creator>GONG ZHENJIE</creator><creator>YU ZIHAO</creator><creator>ZHANG WEI</creator><creator>ZHANG ZHENKAI</creator><creator>LU KAILING</creator><creator>YU XINGMEI</creator><scope>EVB</scope></search><sort><creationdate>20230808</creationdate><title>Chemical filament residual agent cleaning device</title><author>GU XIAOJIAN ; 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an upper connecting plate is fixedly mounted at the upper ends of the two supporting columns jointly, the ends of a plurality of filaments can be uniformly clamped through the collecting assembly, then the filaments are automatically drawn out through a first motor, and therefore people do not need to throw and adjust the filaments; the problems that a plurality of filament materials are inconvenient to collect during cleaning, so that the filament materials need to be manually treated by personnel, the contact</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR LAUNDERING TEXTILES TREATING TEXTILE MATERIALS BY LIQUIDS, GASES OR VAPOURS TREATMENT OF TEXTILES OR THE LIKE |
| title | Chemical filament residual agent cleaning device |
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