Method for preparing Mg67Zn28Ca5 amorphous film on pure magnesium surface by magnetron sputtering
The embodiment of the invention discloses a method for preparing an Mg67Zn28Ca5 amorphous film on a pure magnesium surface by adopting magnetron sputtering, which is used for solving the technical problems of poor corrosion resistance and high degradation rate in a human body of the existing pure ma...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The embodiment of the invention discloses a method for preparing an Mg67Zn28Ca5 amorphous film on a pure magnesium surface by adopting magnetron sputtering, which is used for solving the technical problems of poor corrosion resistance and high degradation rate in a human body of the existing pure magnesium surface. The preparation method provided by the invention comprises the following steps: smelting intermediate alloy blocks Mg80Zn20 and Mg70Ca30 which are prepared in advance and a pure Zn block to obtain an Mg67Zn28Ca5 alloy target material, putting the Mg67Zn28Ca5 alloy target material on a target position of a magnetron sputtering vacuum chamber, ultrasonically cleaning a treated Si sheet, putting the cleaned Si sheet on a sample table of the magnetron sputtering vacuum chamber, and preparing the Mg67Zn28Ca5 amorphous film on the Si sheet through magnetron sputtering, and verifying by using an X-ray diffraction method to determine that the film on the Si sheet is the Mg67Zn28Ca5 amorphous film. And fina |
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