Preparation method of semiconductor element

The invention discloses a preparation method of a semiconductor element. The preparation method comprises the following steps: providing a substrate; forming a word line trench in the substrate; conformally forming a first insulating layer in the word line trench, and conformally forming a first bar...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIAO ZHEXIAN, ZHANG YUZHANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ELECTRICITY
Online-Zugang:	Volltext bestellen
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