Residual gas analyzer

Disclosed herein is a residual gas analysis device for detecting a gas in a vacuum tool, comprising: one or more ion sources configured to ionize the gas in the residual gas analysis device; one or more detectors configured to detect the gas ionized by the ion source; and one or more gas generating...

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Bibliographische Detailangaben
Hauptverfasser:	HILKENS MARK J, VAN DER KERKHOF ADRIANUS M. C. P. L, GILLIS ROBIN T. M, OSTERBOAN ROEL W. F, KRUIJTMANS HENDRIKUS PETRUS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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Beschreibung
Zusammenfassung:	Disclosed herein is a residual gas analysis device for detecting a gas in a vacuum tool, comprising: one or more ion sources configured to ionize the gas in the residual gas analysis device; one or more detectors configured to detect the gas ionized by the ion source; and one or more gas generating filaments configured to generate a gas within the residual gas analysis device. 本文公开了一种用于检测真空工具中的气体的残余气体分析装置，包括：一个或多个离子源，被配置成电离余气体分析装置中的气体；一个或多个检测器，被配置成检测由离子源电离的气体；以及一个或多个气体产生丝，被配置成在残余气体分析装置内产生气体。