Reaction chamber structure for preparing boron alkene through chemical vapor deposition and manufacturing method of reaction chamber structure

The invention relates to a reaction chamber structure for preparing boron alkene through chemical vapor deposition and a manufacturing method of the reaction chamber structure, and belongs to the technical field of two-dimensional thin film preparation. The reaction chamber structure comprises a fir...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	FAN XIANGQIAN, LIU LEI, HU SHENGLIANG, BI TING, WANG HUIQI, ZHANG YUNZHE, WANG MEI, WANG LIYONG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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