Reaction chamber structure for preparing boron alkene through chemical vapor deposition and manufacturing method of reaction chamber structure

The invention relates to a reaction chamber structure for preparing boron alkene through chemical vapor deposition and a manufacturing method of the reaction chamber structure, and belongs to the technical field of two-dimensional thin film preparation. The reaction chamber structure comprises a first corundum cylindrical pipe, a reaction device and a deposition device are arranged in the first corundum cylindrical pipe, the reaction device adopts a corundum boat, the deposition device comprises a second corundum cylindrical pipe, and a self-supporting superposition structure is arranged in the second corundum cylindrical pipe. The self-supporting superposition structure is composed of a lower-layer substrate, a middle-layer substrate and an upper-layer substrate. The reaction chamber is scientific in structural design, ingenious in structure, easy to manufacture and convenient to use, and the purpose of directly and effectively increasing the yield of boraene under the condition that other supports or condit