Interferometer system and lithographic apparatus

An interferometer system comprising: a first detector for receiving a first measurement beam traveling to a reference surface; a second detector for receiving a second measurement beam adapted to travel across the target surface; a reference variable delay path and/or a measurement variable delay pa...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	JENSEN MICHAEL J
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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