Semiconductor structure and forming method thereof

The invention discloses a semiconductor structure and a forming method thereof, and the structure comprises a substrate which comprises a first region, an isolation region and a second region which are arranged along a first direction, the first region is provided with a plurality of first active re...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ZHU HAOZHOU, WANG JUN, CAI YANFEI, YU YANG, FANG ZONGYONG, WANG DAIPING
Format: Patent
Sprache:chi ; eng
Schlagworte:
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