SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANAGING PROCESS OF SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANAGING PROCESS OF SUBSTRATE PROCESSING APPARATUS

The invention discloses a substrate processing apparatus and a process management method of the substrate processing apparatus, and relates to the following steps: mastering the process current condition of each of a plurality of process chambers provided in the substrate processing apparatus, putti...

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1. Verfasser: YANG YOUNG-HWAN
Format: Patent
Sprache:chi ; eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator YANG YOUNG-HWAN
description The invention discloses a substrate processing apparatus and a process management method of the substrate processing apparatus, and relates to the following steps: mastering the process current condition of each of a plurality of process chambers provided in the substrate processing apparatus, putting a substrate to be processed into each process chamber, and storing the substrate in a storage chamber provided in a transfer chamber; and transferring the substrate stored in the storage chamber to the substrate processing apparatus of the corresponding process chamber according to the process proceeding situation of the corresponding process chamber. The substrate processing apparatus includes: a plurality of process chambers performing a process procedure for a substrate; a transfer chamber that is provided with a storage chamber that is disposed between the plurality of process chambers and that temporarily stores a substrate to be processed, and a transfer robot that transfers the substrate to the storage ch
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language chi ; eng
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANAGING PROCESS OF SUBSTRATE PROCESSING APPARATUS
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