Preparation method of groove

The invention relates to the technical field of semiconductors, in particular to a preparation method of a groove. The preparation method of the groove comprises the following steps: providing a substrate, wherein the substrate comprises a region to be etched for the first time; forming a photoresis...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHI YICHANG, LUO JUN, LI BINHONG, WU ZONGYE, WANG YUN, YE TIANCHUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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