SUPPORT UNIT AND APPARATUS FOR PROCESSING SUBSTRATE

The inventive concept provides a support unit for supporting a substrate. The support unit for supporting the substrate includes: a first plate; the heating element is arranged at the first plate and is used for controlling the temperature of the corresponding area of the substrate; a power supply module configured to generate at least two types of power having different frequencies; a power line that transmits power generated by the power supply module to the heating element; and a filter installed at the power line to selectively filter power supplied to the heating element. 本发明构思提供一种用于支撑基板的支撑单元。用于支撑所述基板的所述支撑单元包括：第一板；加热元件，所述加热元件设置在所述第一板处，用于控制所述基板的相应区域的温度；电力供应模块，所述电力供应模块被配置为生成具有不同频率的至少两种电力；电力线，所述电力线将由所述电力供应模块生成的电力传输到所述加热元件；以及滤波器，所述滤波器安装在所述电力线处以对供应到所述加热元件的电力选择性地进行滤波。