Wafer monolithic cleaning machine capable of simultaneously cleaning two surfaces of wafer
The invention belongs to the technical field of cleaning machine equipment, and particularly relates to a wafer single-piece type cleaning machine capable of cleaning the two faces of a wafer simultaneously, and the wafer single-piece type cleaning machine comprises a bottom plate, two symmetrically...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | XU ZHULIN |
| description | The invention belongs to the technical field of cleaning machine equipment, and particularly relates to a wafer single-piece type cleaning machine capable of cleaning the two faces of a wafer simultaneously, and the wafer single-piece type cleaning machine comprises a bottom plate, two symmetrically-arranged connecting plates are installed at the top of the bottom plate, and the same rotating plate is rotatably installed on the sides, close to each other, of the two connecting plates; a first servo motor is installed on one side of the connecting plate, an output shaft of the first servo motor is installed on a rotating plate, a plurality of fixing holes are formed in the top of the rotating plate, placing grooves are formed in the inner walls of the two sides of the fixing holes, round holes are formed in the inner walls of the tops of the placing grooves, and connecting grooves are formed in the inner walls of the two sides of the round holes. And through meshing arrangement of a second rack and a gear, the |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN115870259A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN115870259A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN115870259A3</originalsourceid><addsrcrecordid>eNrjZIgKT0xLLVLIzc_Lz8ksychMVkjOSU3My8xLV8hNTM7IzEtVSE4sSEzKSVXIT1MozswtzSlJzEvNLy3OqUQoLSnPVyguLUpLTE4tBqkrBxnKw8CalphTnMoLpbkZFN1cQ5w9dFML8uNTiwuAivNSS-Kd_QwNTS3MDYxMLR2NiVEDAF00O3o</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Wafer monolithic cleaning machine capable of simultaneously cleaning two surfaces of wafer</title><source>esp@cenet</source><creator>XU ZHULIN</creator><creatorcontrib>XU ZHULIN</creatorcontrib><description>The invention belongs to the technical field of cleaning machine equipment, and particularly relates to a wafer single-piece type cleaning machine capable of cleaning the two faces of a wafer simultaneously, and the wafer single-piece type cleaning machine comprises a bottom plate, two symmetrically-arranged connecting plates are installed at the top of the bottom plate, and the same rotating plate is rotatably installed on the sides, close to each other, of the two connecting plates; a first servo motor is installed on one side of the connecting plate, an output shaft of the first servo motor is installed on a rotating plate, a plurality of fixing holes are formed in the top of the rotating plate, placing grooves are formed in the inner walls of the two sides of the fixing holes, round holes are formed in the inner walls of the tops of the placing grooves, and connecting grooves are formed in the inner walls of the two sides of the round holes. And through meshing arrangement of a second rack and a gear, the</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; BLASTING ; CLEANING ; CLEANING IN GENERAL ; DRYING ; DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; SEMICONDUCTOR DEVICES ; TRANSPORTING ; WEAPONS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230331&DB=EPODOC&CC=CN&NR=115870259A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230331&DB=EPODOC&CC=CN&NR=115870259A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>XU ZHULIN</creatorcontrib><title>Wafer monolithic cleaning machine capable of simultaneously cleaning two surfaces of wafer</title><description>The invention belongs to the technical field of cleaning machine equipment, and particularly relates to a wafer single-piece type cleaning machine capable of cleaning the two faces of a wafer simultaneously, and the wafer single-piece type cleaning machine comprises a bottom plate, two symmetrically-arranged connecting plates are installed at the top of the bottom plate, and the same rotating plate is rotatably installed on the sides, close to each other, of the two connecting plates; a first servo motor is installed on one side of the connecting plate, an output shaft of the first servo motor is installed on a rotating plate, a plurality of fixing holes are formed in the top of the rotating plate, placing grooves are formed in the inner walls of the two sides of the fixing holes, round holes are formed in the inner walls of the tops of the placing grooves, and connecting grooves are formed in the inner walls of the two sides of the round holes. And through meshing arrangement of a second rack and a gear, the</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>DRYING</subject><subject>DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>HEATING</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIgKT0xLLVLIzc_Lz8ksychMVkjOSU3My8xLV8hNTM7IzEtVSE4sSEzKSVXIT1MozswtzSlJzEvNLy3OqUQoLSnPVyguLUpLTE4tBqkrBxnKw8CalphTnMoLpbkZFN1cQ5w9dFML8uNTiwuAivNSS-Kd_QwNTS3MDYxMLR2NiVEDAF00O3o</recordid><startdate>20230331</startdate><enddate>20230331</enddate><creator>XU ZHULIN</creator><scope>EVB</scope></search><sort><creationdate>20230331</creationdate><title>Wafer monolithic cleaning machine capable of simultaneously cleaning two surfaces of wafer</title><author>XU ZHULIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN115870259A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>DRYING</topic><topic>DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>HEATING</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>XU ZHULIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>XU ZHULIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Wafer monolithic cleaning machine capable of simultaneously cleaning two surfaces of wafer</title><date>2023-03-31</date><risdate>2023</risdate><abstract>The invention belongs to the technical field of cleaning machine equipment, and particularly relates to a wafer single-piece type cleaning machine capable of cleaning the two faces of a wafer simultaneously, and the wafer single-piece type cleaning machine comprises a bottom plate, two symmetrically-arranged connecting plates are installed at the top of the bottom plate, and the same rotating plate is rotatably installed on the sides, close to each other, of the two connecting plates; a first servo motor is installed on one side of the connecting plate, an output shaft of the first servo motor is installed on a rotating plate, a plurality of fixing holes are formed in the top of the rotating plate, placing grooves are formed in the inner walls of the two sides of the fixing holes, round holes are formed in the inner walls of the tops of the placing grooves, and connecting grooves are formed in the inner walls of the two sides of the round holes. And through meshing arrangement of a second rack and a gear, the</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN115870259A |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS BLASTING CLEANING CLEANING IN GENERAL DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING WEAPONS |
| title | Wafer monolithic cleaning machine capable of simultaneously cleaning two surfaces of wafer |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-03T04%3A06%3A02IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=XU%20ZHULIN&rft.date=2023-03-31&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN115870259A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |