Wafer monolithic cleaning machine capable of simultaneously cleaning two surfaces of wafer

The invention belongs to the technical field of cleaning machine equipment, and particularly relates to a wafer single-piece type cleaning machine capable of cleaning the two faces of a wafer simultaneously, and the wafer single-piece type cleaning machine comprises a bottom plate, two symmetrically-arranged connecting plates are installed at the top of the bottom plate, and the same rotating plate is rotatably installed on the sides, close to each other, of the two connecting plates; a first servo motor is installed on one side of the connecting plate, an output shaft of the first servo motor is installed on a rotating plate, a plurality of fixing holes are formed in the top of the rotating plate, placing grooves are formed in the inner walls of the two sides of the fixing holes, round holes are formed in the inner walls of the tops of the placing grooves, and connecting grooves are formed in the inner walls of the two sides of the round holes. And through meshing arrangement of a second rack and a gear, the