Extreme ultraviolet lithography mask multilayer film defect morphology reconstruction method

The invention relates to an extreme ultraviolet lithography blank mask multilayer film defect morphology reconstruction method. According to the method, blank mask multilayer film defect space images in multiple illumination directions are adopted to represent phase information of image missing, and...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LI SIKUN, WANG XIANGCHAO, ZHENG HANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CALCULATING COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING IMAGE DATA PROCESSING OR GENERATION, IN GENERAL PHYSICS
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