Plasma processing apparatus

Provided is a highly safe plasma processing apparatus that suppresses operating costs. The plasma processing apparatus includes: a vacuum container; a processing chamber disposed inside the vacuum container; and a gas supply unit provided with a processing gas line for supplying a processing gas into the processing chamber so as to form plasma in the processing chamber, the processing unit having a plurality of pipes through which a plurality of types of gases flow, and a housing surrounding the pipes, the air of which the temperature has been adjusted to a prescribed range is supplied to the housing. 提供抑制运行成本并且安全性高的等离子体处理装置。等离子体处理装置具有：真空容器；处理室，其配置于所述真空容器的内部；以及气体供给单元，其具备向所述处理室内供给处理用气体的处理用气体管线，以便在所述处理室内形成等离子体，所述处理单元具有使多种气体各自按照种类流通的多个配管以及包围所述配管的箱体，向所述箱体供给已温度调节到规定的范围的空气。