Processing device

The invention provides a processing apparatus which cleans a wider range of a processing chamber cover than fluid ejection from a nozzle. The processing apparatus includes: a chuck table that holds an object to be processed; a machining unit having a main shaft and machining the workpiece attracted...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: HOSHIKAWA HIROTOSHI
Format: Patent
Sprache:chi ; eng
Schlagworte:
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