PECVD (plasma enhanced chemical vapor deposition) reaction chamber electrode stem
The invention discloses a PECVD (Plasma Enhanced Chemical Vapor Deposition) reaction chamber electrode stem. The PECVD reaction chamber electrode stem comprises a wiring rod, a connecting rod, an inner insulating seat, an outer insulating seat, a locking cylinder, a pressing assembly and an electrod...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a PECVD (Plasma Enhanced Chemical Vapor Deposition) reaction chamber electrode stem. The PECVD reaction chamber electrode stem comprises a wiring rod, a connecting rod, an inner insulating seat, an outer insulating seat, a locking cylinder, a pressing assembly and an electrode flange, the inner insulating seat and the outer insulating seat are sleeved on the connecting rod, the outer locking cylinder is sleeved on the junction pole and the outer insulating seat, the locking cylinder abuts against the outer side of the shaft ring, the other end of the locking cylinder is pressed on the outer insulating seat through a pressing assembly, one end of the connecting rod is provided with a first limiting groove communicated with the threaded hole, and a limiting plate is arranged in the first limiting groove. A second limiting groove is formed in one end of the wiring rod, and after one end of the wiring rod is in threaded connection with the threaded hole of the connecting rod, the limiting |
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