Method for depositing silicon nitride layer on surface of carbon material through oxidation and vapor reaction

The invention discloses a method for oxidizing on the surface of a carbon material and depositing a silicon nitride layer through vapor reaction, and relates to a method for vapor reaction deposition on the surface of the carbon material. The method aims at solving the problem that a high-temperatur...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	LYU TIEZHENG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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