Semiconductor device and forming method thereof

The invention provides a semiconductor device and a forming method thereof. The semiconductor device comprises a first substrate; the first device is positioned on the first substrate; the first dielectric layer and the first conductive plug are located on the first device; the first dielectric laye...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: PENG XIAOMAO, GAN TAO, HOU YONGTIAN, WANG DAN, WANG YANXIA
Format: Patent
Sprache:chi ; eng
Schlagworte:
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