Liquid distributor and wet chemical treatment tank comprising same
The invention provides a liquid distributor and a wet chemical treatment tank, relates to the technical field of semiconductor manufacturing, and solves the technical problems that etching agent solutions at different positions of a treatment tank are different in concentration, and the etching rate...
Gespeichert in:
Hauptverfasser: | , , , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | LIU KANGHUA ZHAO DAGUO YAN QIANG CHENG JIANGYAN ZHU YANJUN WANG YAOLIN |
description | The invention provides a liquid distributor and a wet chemical treatment tank, relates to the technical field of semiconductor manufacturing, and solves the technical problems that etching agent solutions at different positions of a treatment tank are different in concentration, and the etching rate is very nonuniform. The liquid distributor comprises a distributor body, a fluid channel for fluid circulation is arranged in the distributor body, a plurality of liquid outlets are formed in the side wall of the distributor body, and all the liquid outlets are different in specification and are sequentially enlarged from one side to the other side; the wet chemical treatment tank comprises a tank body, a liquid distributor is arranged in the tank body, and a liquid inlet communicated with the outside of the tank body and the fluid channel is further formed in the tank body; the liquid outlet close to one side of the liquid inlet has the smallest specification; the groove body comprises a first side wall and a sec |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN115116901A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN115116901A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN115116901A3</originalsourceid><addsrcrecordid>eNqNyrEKAjEMANAuDqL-Q-4DBIMoOHqH4iBO7kdsowavaW1z-PsufoDTW97UtWd5jxIgSLUit9FSAdIAHzbwT47iaQArTBZZDYz0BT7FXKSKPqBS5Lmb3GmovPg5c83xcO1OS86p55rJs7L13QVxg7jdrXC__ud8AWp2Mlo</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Liquid distributor and wet chemical treatment tank comprising same</title><source>esp@cenet</source><creator>LIU KANGHUA ; ZHAO DAGUO ; YAN QIANG ; CHENG JIANGYAN ; ZHU YANJUN ; WANG YAOLIN</creator><creatorcontrib>LIU KANGHUA ; ZHAO DAGUO ; YAN QIANG ; CHENG JIANGYAN ; ZHU YANJUN ; WANG YAOLIN</creatorcontrib><description>The invention provides a liquid distributor and a wet chemical treatment tank, relates to the technical field of semiconductor manufacturing, and solves the technical problems that etching agent solutions at different positions of a treatment tank are different in concentration, and the etching rate is very nonuniform. The liquid distributor comprises a distributor body, a fluid channel for fluid circulation is arranged in the distributor body, a plurality of liquid outlets are formed in the side wall of the distributor body, and all the liquid outlets are different in specification and are sequentially enlarged from one side to the other side; the wet chemical treatment tank comprises a tank body, a liquid distributor is arranged in the tank body, and a liquid inlet communicated with the outside of the tank body and the fluid channel is further formed in the tank body; the liquid outlet close to one side of the liquid inlet has the smallest specification; the groove body comprises a first side wall and a sec</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220927&DB=EPODOC&CC=CN&NR=115116901A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220927&DB=EPODOC&CC=CN&NR=115116901A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LIU KANGHUA</creatorcontrib><creatorcontrib>ZHAO DAGUO</creatorcontrib><creatorcontrib>YAN QIANG</creatorcontrib><creatorcontrib>CHENG JIANGYAN</creatorcontrib><creatorcontrib>ZHU YANJUN</creatorcontrib><creatorcontrib>WANG YAOLIN</creatorcontrib><title>Liquid distributor and wet chemical treatment tank comprising same</title><description>The invention provides a liquid distributor and a wet chemical treatment tank, relates to the technical field of semiconductor manufacturing, and solves the technical problems that etching agent solutions at different positions of a treatment tank are different in concentration, and the etching rate is very nonuniform. The liquid distributor comprises a distributor body, a fluid channel for fluid circulation is arranged in the distributor body, a plurality of liquid outlets are formed in the side wall of the distributor body, and all the liquid outlets are different in specification and are sequentially enlarged from one side to the other side; the wet chemical treatment tank comprises a tank body, a liquid distributor is arranged in the tank body, and a liquid inlet communicated with the outside of the tank body and the fluid channel is further formed in the tank body; the liquid outlet close to one side of the liquid inlet has the smallest specification; the groove body comprises a first side wall and a sec</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEKAjEMANAuDqL-Q-4DBIMoOHqH4iBO7kdsowavaW1z-PsufoDTW97UtWd5jxIgSLUit9FSAdIAHzbwT47iaQArTBZZDYz0BT7FXKSKPqBS5Lmb3GmovPg5c83xcO1OS86p55rJs7L13QVxg7jdrXC__ud8AWp2Mlo</recordid><startdate>20220927</startdate><enddate>20220927</enddate><creator>LIU KANGHUA</creator><creator>ZHAO DAGUO</creator><creator>YAN QIANG</creator><creator>CHENG JIANGYAN</creator><creator>ZHU YANJUN</creator><creator>WANG YAOLIN</creator><scope>EVB</scope></search><sort><creationdate>20220927</creationdate><title>Liquid distributor and wet chemical treatment tank comprising same</title><author>LIU KANGHUA ; ZHAO DAGUO ; YAN QIANG ; CHENG JIANGYAN ; ZHU YANJUN ; WANG YAOLIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN115116901A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>LIU KANGHUA</creatorcontrib><creatorcontrib>ZHAO DAGUO</creatorcontrib><creatorcontrib>YAN QIANG</creatorcontrib><creatorcontrib>CHENG JIANGYAN</creatorcontrib><creatorcontrib>ZHU YANJUN</creatorcontrib><creatorcontrib>WANG YAOLIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LIU KANGHUA</au><au>ZHAO DAGUO</au><au>YAN QIANG</au><au>CHENG JIANGYAN</au><au>ZHU YANJUN</au><au>WANG YAOLIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Liquid distributor and wet chemical treatment tank comprising same</title><date>2022-09-27</date><risdate>2022</risdate><abstract>The invention provides a liquid distributor and a wet chemical treatment tank, relates to the technical field of semiconductor manufacturing, and solves the technical problems that etching agent solutions at different positions of a treatment tank are different in concentration, and the etching rate is very nonuniform. The liquid distributor comprises a distributor body, a fluid channel for fluid circulation is arranged in the distributor body, a plurality of liquid outlets are formed in the side wall of the distributor body, and all the liquid outlets are different in specification and are sequentially enlarged from one side to the other side; the wet chemical treatment tank comprises a tank body, a liquid distributor is arranged in the tank body, and a liquid inlet communicated with the outside of the tank body and the fluid channel is further formed in the tank body; the liquid outlet close to one side of the liquid inlet has the smallest specification; the groove body comprises a first side wall and a sec</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | chi ; eng |
recordid | cdi_epo_espacenet_CN115116901A |
source | esp@cenet |
subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
title | Liquid distributor and wet chemical treatment tank comprising same |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T03%3A43%3A09IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LIU%20KANGHUA&rft.date=2022-09-27&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN115116901A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |