Grinding device for semiconductor wafer production

The grinding device for semiconductor wafer production comprises first linear sliding rails, first sliding blocks, a box body and a square pipe, the bottom end of the box body is fixedly connected with a bottom box, meanwhile, a box door is arranged on one side of the box body, and second linear sli...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: YIN ZEAN, CHEN DIANWEN
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator YIN ZEAN
CHEN DIANWEN
description The grinding device for semiconductor wafer production comprises first linear sliding rails, first sliding blocks, a box body and a square pipe, the bottom end of the box body is fixedly connected with a bottom box, meanwhile, a box door is arranged on one side of the box body, and second linear sliding rails are symmetrically arranged at the bottom end of the interior of the box body; a second sliding block is slidably connected to the second linear sliding rail, the top end of the second sliding block is fixedly connected to a bearing plate, a square hole is formed in the center of the bearing plate, a square pipe is placed in the square hole, the top end of the square pipe is fixedly connected to a placing plate, and placing grooves are formed in the two sides of the top end of the placing plate correspondingly; and meanwhile, connecting legs are fixedly connected to the four corners of the bottom end of the bearing plate correspondingly, the connecting pipes installed on the grinding wheel are limited thr
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN115056060A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN115056060A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN115056060A3</originalsourceid><addsrcrecordid>eNrjZDByL8rMS8nMS1dISS3LTE5VSMsvUihOzc1Mzs9LKU0uAfLKE9NSixQKivJB_Mz8PB4G1rTEnOJUXijNzaDo5hri7KGbWpAfn1pckJicmpdaEu_sZ2hoamBqZmBm4GhMjBoA8qEsbQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Grinding device for semiconductor wafer production</title><source>esp@cenet</source><creator>YIN ZEAN ; CHEN DIANWEN</creator><creatorcontrib>YIN ZEAN ; CHEN DIANWEN</creatorcontrib><description>The grinding device for semiconductor wafer production comprises first linear sliding rails, first sliding blocks, a box body and a square pipe, the bottom end of the box body is fixedly connected with a bottom box, meanwhile, a box door is arranged on one side of the box body, and second linear sliding rails are symmetrically arranged at the bottom end of the interior of the box body; a second sliding block is slidably connected to the second linear sliding rail, the top end of the second sliding block is fixedly connected to a bearing plate, a square hole is formed in the center of the bearing plate, a square pipe is placed in the square hole, the top end of the square pipe is fixedly connected to a placing plate, and placing grooves are formed in the two sides of the top end of the placing plate correspondingly; and meanwhile, connecting legs are fixedly connected to the four corners of the bottom end of the bearing plate correspondingly, the connecting pipes installed on the grinding wheel are limited thr</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220916&amp;DB=EPODOC&amp;CC=CN&amp;NR=115056060A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220916&amp;DB=EPODOC&amp;CC=CN&amp;NR=115056060A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YIN ZEAN</creatorcontrib><creatorcontrib>CHEN DIANWEN</creatorcontrib><title>Grinding device for semiconductor wafer production</title><description>The grinding device for semiconductor wafer production comprises first linear sliding rails, first sliding blocks, a box body and a square pipe, the bottom end of the box body is fixedly connected with a bottom box, meanwhile, a box door is arranged on one side of the box body, and second linear sliding rails are symmetrically arranged at the bottom end of the interior of the box body; a second sliding block is slidably connected to the second linear sliding rail, the top end of the second sliding block is fixedly connected to a bearing plate, a square hole is formed in the center of the bearing plate, a square pipe is placed in the square hole, the top end of the square pipe is fixedly connected to a placing plate, and placing grooves are formed in the two sides of the top end of the placing plate correspondingly; and meanwhile, connecting legs are fixedly connected to the four corners of the bottom end of the bearing plate correspondingly, the connecting pipes installed on the grinding wheel are limited thr</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDByL8rMS8nMS1dISS3LTE5VSMsvUihOzc1Mzs9LKU0uAfLKE9NSixQKivJB_Mz8PB4G1rTEnOJUXijNzaDo5hri7KGbWpAfn1pckJicmpdaEu_sZ2hoamBqZmBm4GhMjBoA8qEsbQ</recordid><startdate>20220916</startdate><enddate>20220916</enddate><creator>YIN ZEAN</creator><creator>CHEN DIANWEN</creator><scope>EVB</scope></search><sort><creationdate>20220916</creationdate><title>Grinding device for semiconductor wafer production</title><author>YIN ZEAN ; CHEN DIANWEN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN115056060A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>YIN ZEAN</creatorcontrib><creatorcontrib>CHEN DIANWEN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YIN ZEAN</au><au>CHEN DIANWEN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Grinding device for semiconductor wafer production</title><date>2022-09-16</date><risdate>2022</risdate><abstract>The grinding device for semiconductor wafer production comprises first linear sliding rails, first sliding blocks, a box body and a square pipe, the bottom end of the box body is fixedly connected with a bottom box, meanwhile, a box door is arranged on one side of the box body, and second linear sliding rails are symmetrically arranged at the bottom end of the interior of the box body; a second sliding block is slidably connected to the second linear sliding rail, the top end of the second sliding block is fixedly connected to a bearing plate, a square hole is formed in the center of the bearing plate, a square pipe is placed in the square hole, the top end of the square pipe is fixedly connected to a placing plate, and placing grooves are formed in the two sides of the top end of the placing plate correspondingly; and meanwhile, connecting legs are fixedly connected to the four corners of the bottom end of the bearing plate correspondingly, the connecting pipes installed on the grinding wheel are limited thr</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN115056060A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
DRESSING OR CONDITIONING OF ABRADING SURFACES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
SEMICONDUCTOR DEVICES
TRANSPORTING
title Grinding device for semiconductor wafer production
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T16%3A32%3A13IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=YIN%20ZEAN&rft.date=2022-09-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN115056060A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true