Method of region of interest processing for reticle particle detection

An inspection system includes a radiation source that generates a radiation beam and illuminates a first surface of an object, thereby defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, w...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WALSH, JOHN, H, WIENER RICHARD B, KREUZER JUSTIN L, KOCHERSPERGER PETER C, PALOSKI MARK E, DOWHAN CONOR M, SOBOLEV KIRILL URIEVICH, BENDIKSEN AAGE, VENKATARAMAN, ARUN, M
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!