Recovery mechanism, substrate processing apparatus, and recovery method

A recovery mechanism for recovering a peripheral edge portion of a substrate removed by a peripheral edge removal mechanism is provided with: a discharge unit for connecting a recovery unit for recovering the removed peripheral edge portion to the peripheral edge removal mechanism; and a path switch...

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Hauptverfasser: NAKANO SEIJI, YAMAWAKI YOHEI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:A recovery mechanism for recovering a peripheral edge portion of a substrate removed by a peripheral edge removal mechanism is provided with: a discharge unit for connecting a recovery unit for recovering the removed peripheral edge portion to the peripheral edge removal mechanism; and a path switching unit configured so as to be able to switch a discharge path of the peripheral portion in the discharge unit. 一种回收机构,其是在周缘去除机构中去除了的基板的周缘部的回收机构,该回收机构具备:排出部,其将对去除了的所述周缘部进行回收的回收部与所述周缘去除机构连接;以及路径切换部,其构成为能够切换所述排出部中的所述周缘部的排出路径。